首页> 外文会议>Proceedings of the 34th IEEE/CPMT International Electronic Manufacturing Technology Symposium >A study on fine pitch Au and Cu WB integrity vs. Ni thickness of Ni/Pd/Au bond pad on C90 low k wafer technology for high temperature automotive
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A study on fine pitch Au and Cu WB integrity vs. Ni thickness of Ni/Pd/Au bond pad on C90 low k wafer technology for high temperature automotive

机译:C90低k晶片技术在高温汽车上的细间距Au和Cu WB完整性对Ni / Pd / Au焊盘的Ni厚度的影响

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摘要

For high temperature automotive application, IC products are required to pass stringent high temperature storage stress test (e.g. 5000hrs at 150 deg C), hence requires reliable wire bonds. Such requirement is especially challenging with fine pitch Au & Cu wire bond (e.g. bond pad pitch > 70um and bonded ball diameter < 58um), more-so on low k wafer technology with bond-over-active requirement.
机译:对于高温汽车应用,IC产品需要通过严格的高温存储应力测试(例如,在150摄氏度下5000小时),因此需要可靠的引线键合。对于细间距的Au和Cu引线键合(例如,键合焊盘间距> 70um,键合球直径<58um),这种要求尤其具有挑战性,尤其是在低k晶圆技术中,要求键合过度。

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