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Mechanical and Electrical Properties of Ga-Doped ZnO Films Deposited on Flexible Substrate by DC Magnetron Sputtering

机译:直流磁控溅射沉积在柔性基板上的Ga掺杂ZnO薄膜的机械和电学性质

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Ga-doped ZnO films were deposited on polyethylene terephthalate (PET) substrate by dc magnetron sputtering using a high density GZO target (doped with 6.65 wt% Ga_2O_3) without substrate heating. We investigated electrical, structural, and mechanical properties of GZO films deposited under various total gas pressures (P_(tot)- GZO films deposited at P_(tot) of 2.0 Pa showed the lowest resistivity (2.91 × 10~(-2) Ωcm), which could be attributed to higher crystallinity of the film. Also, this GZO film showed the lowest change in resistance (ΔR/R_0 = 0.3) for the dynamic bending test.
机译:在不对衬底进行加热的情况下,使用高密度GZO靶(掺杂有6.65 wt%的Ga_2O_3)通过dc磁控溅射将Ga掺杂的ZnO薄膜沉积在聚对苯二甲酸乙二醇酯(PET)衬底上。我们研究了在各种总气体压力下沉积的GZO膜的电,结构和机械性能(P_(tot)-在P_(tot)为2.0 Pa时沉积的GZO膜显示出最低的电阻率(2.91×10〜(-2)Ωcm)另外,该GZO膜在动态弯曲试验中显示出最低的电阻变化(ΔR/ R_0 = 0.3)。

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