DEPOSITION OF AMORPHOUS SILICON/MICROCRYSTALLINE SILICON FOR TANDEM SOLAR CELLS USING CLUSTER PECVD TOOL ON JUMBO SIZE SUBSTRATES (GEN 8.5)

摘要

There has been extensive activity for the development of tandem junction cells utilizing a combination of amorphous Si (a-Si:H) and microcrystalline Si (μc-Si:H) for optimal cell efficiency. To achieve economies of scale, it is necessary to develop uniform, large area deposition of high-quality tandem films. We report on the development and optimization of a-Si:H/μc-Si:H tandem junction solar cells using single chamber cluster plasma-enhanced chemical vapor deposition tools, which are commercially available from Applied Materials as mass production systems for thin film transistor liquid crystal display (TFT-LCD) manufacturing. Large area scaling to Gen 8.5 glass (2200×2600 mm~2) allows for economies of scale, along with the ability to deposit quality films with good uniformity.