首页> 外文会议>International Conference of the European Society for Precision Engineering and Nanotechnology >Double-sided lapping of thin copper substrate by textured fixed-abrasive pad
【24h】

Double-sided lapping of thin copper substrate by textured fixed-abrasive pad

机译:纹理固定研磨垫双面研磨薄铜基板

获取原文

摘要

Thin copper substrates with high accuracy and high surface integrity play as the extremely key components in precision physical experiments. Normally, fly cutting process is adopted to meet the requirements. However, due to the deformation of substrates caused by clamping and machining stresses, the target values cannot be achieved after disassembly. Hence, this paper presented double-sided lapping by textured fixed-abrasive pad to fabricate thin copper substrates. A flatness error compensation method was proposed to achieve high flatness taking advantage of the concave-convex surface shapes. The correlations between flatness, residual stress and subsurface defects were investigated. The results show that double-sided lapping removed the defective layer and released the residual stress induced in prior turning process. Superior to 4 μm flatness peak-to-valley (PV) was attained on both of the surfaces of Φ100 mm thin substrate by the flatness error compensation method even if the flatness PV of lapping plates were over 20 μm. The deformation layer caused by double-sided lapping was less than 2 μm.
机译:薄铜基板具有高精度和高表面完整性,作为精密物理实验中的极其关键部件。通常,采用飞行过程来满足要求。然而,由于由夹紧和加工应力引起的基板的变形,拆卸后不能实现目标值。因此,本文介绍了纹理的固定研磨垫双面研磨,以制造薄铜基材。提出了一种平坦的误差补偿方法,以实现利用凹凸表面形状的高平整度。研究了平坦度,残余应力和地下缺陷之间的相关性。结果表明,双面研磨去除了缺陷层并释放了先前转弯过程中诱导的残余应力。通过平坦度误差补偿方法,在φ100mm薄基板的两个表面上,达到4μm平坦度峰谷(PV)即使研磨板的平坦度PV超过20μm,则达到φ100mm薄基板的两个表面。由双面研磨引起的变形层小于2μm。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号