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TEST AND WIREBOND CHALLENGES FOR FINE PITCH, LOW-K, AND COPPER WAFERS

机译:精细间距,低K和铜晶片的测试和焊线挑战

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摘要

In conclusion, collaborative work is yielding evidence that wire bond interconnects will continue to enable the new technologies such as low-k and copper that are being used to sustain the shrinkage trend in semiconductor packaging.
机译:总而言之,协作工作正在产生证据,表明引线键合互连将继续支持诸如低介电常数和铜等新技术,这些新技术将用于维持半导体封装的缩小趋势。

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