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Structural perfection diagnostics of narrow-gap photosensitive semiconductors junctions by electron diffraction

机译:窄间隙光敏半导体结的电子衍射结构完美诊断

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In the work are studied structural, electrical and optical properties of film heterojunctions p-Pb_1-xTe - n-PbTe obtained by condensation of molecular beams in vacuum approx 10~-6 mm mercury pressure. It is determined that diffusion fringes intensity on diffraction patterns are different depending on thickness of films (d) and temperature of film growing (T_f). The intensity of iffusion fringes also depends on survey temperature (T_s). The correlation between intensity of diffusion fringes on electron diffraction patterns and photosensitivity of heterojunctions Pb_1-xSn_xTe-PbTe is found.
机译:在这项工作中研究了薄膜异质结p-Pb_1-xTe-n-PbTe的结构,电学和光学性质,这些异质结是通过在约10〜-6 mm汞柱压力下的真空中分子束的冷凝而获得的。可以确定,衍射图案上的扩散条纹强度取决于薄膜的厚度(d)和薄膜的生长温度(T_f)而不同。渗流条纹的强度还取决于测量温度(T_s)。发现电子衍射图上扩散条纹的强度与异质结Pb_1-xSn_xTe-PbTe的光敏性之间的相关性。

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