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Robust mask-layout and process synthesis theourgh an evo0lutionary algorithm

机译:鲁棒的掩膜版图设计和工艺综合方法

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A method for automated maks-alyout and process synthesis for MEMS is presented. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, thsi synthetsis method will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). Given complicated device shapes and wide range of fabrication process possibilities, the designer may econunter difficulty producing the right mask-layout and fabrication procedure by experience and trial and error. An automated synthesis tool like this will be helpful to the designer by increasing the efficiency and accuracy of the design of MEMS devices.
机译:提出了一种用于MEMS的自动化的mak-alyout和过程综合的方法。通过使用遗传算法来解决综合问题。对于给定的所需器件形状和几种制造工艺选择,该合成方法将产生一个或多个掩模布局和相关的制造工艺序列(使用时可产生接近于所需形状的形状)。考虑到复杂的器件形状和广泛的制造工艺可能性,设计人员可能会因经验和反复试验而难以制作正确的掩膜版图和制造程序。像这样的自动合成工具将通过提高MEMS器件设计的效率和准确性对设计人员有所帮助。

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