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Field Emission Characteristics of CVD Diamond Coated Copper Field Emitters

机译:CVD金刚石涂覆的铜场发射体的场发射特性

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摘要

The polycrystalline diamond films were synthesized on copper substrate by microwave plasma chemical vapor deposition technique. The field emission characteristics and the electrical characteristics of contacts between metal and diamond film have investigated.
机译:采用微波等离子体化学气相沉积技术在铜基片上合成了多晶金刚石膜。研究了金属和金刚石膜之间接触的场发射特性和电特性。

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