Ion-assisted deposition of E-Gun evaporated ITO films at low substrate temperatures

摘要

ITO films have traditionally been deposited by sputtering on low temperature substrates and by evaporation os substrates heated to high temperatures. Recent wrk in our Application Laboratory using ion assisted deposition (IAD) at low sub-strate temperatures with a broad beam cold cathode ion source has resulted in ITO film properties comparable to non-IAD high temperature evaporation. This work reports the electrical and optical properties for ITO films deposited over a broad parameter space.