Bipolar bulsed DC sputtering of optical films

摘要

Biipolar pulsed DC sputtering is a new technique for high rate reactive deposition of dielectric oxides on diverse types of substrates. This effort reports on the application ob bipolar pulsed DC sputtering to generate single layer and multilayer oxide coatings on flat curved, glass and plastic substrate surfaces. The optical (refractive index and extinction coefficient) and physical (durability and mositure stability) properties of Ta_2O_5 TiO_2, ZrO_2, Nb_2O_5, WO_4, Al_2O_3 and SiO_2 films and films stacks are presented.