Synthesis of carbon nitride, silcon dioxide and siicon nitride by electron cyclotron resonance chemical vapor deposition

摘要

Resultrs reported last year showed that a crystalline phase of chlorine-doped carbon nitride (CN_x:Cl) can be deposited using electron cyclotron resonance chemical capor deposition (ECR-CVD) [1]. During the past year, efforts concentrated on improving the long-term-moisture stability of the ECR-CVD CNB_x:Cl films. The instability of the films with respoect to moisture incoproration was attributed to a combination of porosity and the presence of a small amount of chlorine.