Simulation and testing of a vertical organometallic vapor phase epitaxy reactor

摘要

The purpose of the study is to design a single wafer vertical organo-metallic vapor phase epitaxy (OMVPE) reactor which gives a uniform deposition around the symmetry axis. The vertical reactor under the consideration consist of a diffuser and a system of coaxial cylinders to laminarize the flow which may lead to a uniform deposition without rotating the susceptor. The simulation shows that for a susceptor with a radius of 2.5 cm, a uniformity can be achieved in a region of a radius of 2 cm within 1% for certain operating condition. The result is compared with the experimental measurement of TiO$-2$/ deposition from TTIP.