首页> 外文会议>Symposium on ferroelectric thin films >CONTROL OF FERROELECTRIC PROPERTIES OF PbZr_xTi_(1-x)O_3 THIN FILM FOR ELECTRON EMISSION DEVICE DRIVEN BY LOW VOLTAGE
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CONTROL OF FERROELECTRIC PROPERTIES OF PbZr_xTi_(1-x)O_3 THIN FILM FOR ELECTRON EMISSION DEVICE DRIVEN BY LOW VOLTAGE

机译:通过低压驱动的电子发射装置的PBZR_XTI_(1-X)O_3薄膜的铁电性能控制

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摘要

Epitaxial PbZr_(0.52)Ti_(0.48)O_3/YBa_2Cu_3O_(7-x) heterostructures on Nd:YAlO_3 and MgO substrates were fabricated by KrF pulsed laser deposition. The coercive electric field of the PZT films increased with decrease of the film thickness from 1.2 μm to 0.04 μm, while the magnitude of spontaneous polarization was almost constant in this thickness range. It was found that the dependence of the film thickness d on the coercive electric field E_c was E_c∝ d~(-2/3). This results from that the PZT/YBCO heterostructure has the one dimensional ferroelectric domain growth without non-ferroelectric phase. The polarization of Au/PZT/YBCO/(MgO or YAlO) capacitors can be changed by the applied voltage below 5 V.
机译:外延PBZR_(0.52)TI_(0.48)O_3 / YBA_2CU_3O_(7-X)异质结构在Nd:YALO_3和MgO基板通过KRF脉冲激光沉积制造。 PZT薄膜的矫顽电场随着薄膜厚度的降低而增加,薄膜厚度为1.2μm至0.04μm,而自发极化的大小在该厚度范围内几乎是恒定的。发现膜厚度D在矫顽电场E_C上的依赖性是E_Cαd〜(-2/3)。这导致PZT / YBCO异质结构具有一维铁电域生长,无非铁相。 AU / PZT / YBCO /(MGO或YALO)电容器的极化可以通过低于5 V的施加电压来改变。

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