首页> 外文会议>Solid State Device Research Conference, 1993. ESSDERC '93 >Performance of 0.2 ¿m planar doped pseudomorphic and lattice matched HEMTs on GaAs and InP
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Performance of 0.2 ¿m planar doped pseudomorphic and lattice matched HEMTs on GaAs and InP

机译:GaAs和InP上的0.2μm平面掺杂假晶和晶格匹配HEMT的性能

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摘要

Two types of HEMT transistors with 0.2 ¿m gatelength have been fabricated: pseudomorphic (PM) on GaAs and lattice matched (LM) on InP. An extensive study of the DC and HF-characteristics shows the higher potential of the InP-based devices: extrinsic fT-values up to 141 GHz were obtained. The monolithic integration of the InP LM HEMT's is illustrated by the performance of a coplanar distributed amplifier.
机译:已经制造出两种栅长为0.2μm的HEMT晶体管:GaAs上的伪晶(PM)和InP上的晶格匹配(LM)。对直流和高频特性的广泛研究表明,基于InP的器件具有更高的潜力:获得了高达141 GHz的非固有fT值。 InP LM HEMT的单片集成通过共面分布式放大器的性能来说明。

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