Laser Induced Damage Threshold and Optical Properties of TiO_2 and Al_2O_3 : Coatings Prepared by Atomic Layer Deposition

摘要

Atomic Layer Deposition (ALD) allows for the deposition of homogeneous and conformal coatings with superior microstructural properties and well controllable thickness. As a consequence, ALD-processes have moved into the focus of optical thin film research during the last decade. In contrast to this, only a relatively small number of investigations in the power handling capability of ALD-coatings have been reported until now. The present contribution summarizes results of a study dedicated to the optical properties of single layers and high reflecting coating systems of TiO_2 and Al_2O_3 deposited by ALD. Besides Laser Induced Damage Threshold (LIDT) values, the spectral characteristics as well the absorption and scatter losses are discussed.