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The nature and impact of ZNO buffer layers on the initial stages of the hydride vapor phase epitaxy of GaN

机译:ZnO缓冲层对GaN的氢化物气相外延初期的性质和影响

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The nauture and imapct of ZnO buffer layers on the initial stages of the hydride vapor phase epitaxy (HVPE) of GaN have been studied by xray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), xray diffraction (XRD) and photoluminescence (PL). During pre-growth heating, the surface ZnO layer was found to both desorb from ZnO-coated sapphire and react with the underlying sapphire surface forming a thin ZnAl_2O_4 alloy layer between ZnO and sapphire surface. This ZnO-derived surface promotes the initial nucleation of the GaN and markedly improves material surface morphoogy, quality and growth reproducibility.
机译:通过X射线光电子能谱(XPS),原子力显微镜(AFM),X射线衍射(XRD)和光致发光(PL)研究了GaN的氢化物蒸汽相外延(HVPE)初始阶段的氢化物气相外延(HVPE)的初始阶段的初始阶段的初始阶段。 )。在预生长中加热期间,发现表面ZnO层对ZnO涂覆的蓝宝石进行解吸并与在ZnO和蓝宝石表面之间形成薄的Znal_2O_4合金层的下面的蓝宝石表面反应。该ZnO衍生的表面促进了GaN的初始成核,并显着提高了材料表面的形态学,质量和生长再现性。

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