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The chemical and electrical properties of InGaN quantum wells grown with interrupts: A comprehensive TEM case study

机译:InGaN量子孔的中断生长的化学和电性能:全面的TEM案例研究

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Using off-axis electron holography, high resolution electron microscopy (HREM) and energy filtering TEM (EFTEM), we have looked at the structure of InGaN multiple quantum wells (MQWs), grown with varying interrupt times. We have measured the piezoelectric field strength, indium concentration and quantum well width. Our results show that indium deposited without an interrupt creates a quantum well with extensive indium fluctuations which have a very weak overall piezoelectric field strength. However using interrupt times ranging from five to thirty seconds creates a quantum well of uniform In composition and an intense piezoelectric field.
机译:使用轴轴电子全息,高分辨率电子显微镜(HREM)和能量滤波TEM(EFTEM),我们研究了IngaN多量子阱(MQW)的结构,具有不同的中断时间。我们测量了压电场强度,铟浓度和量子孔宽度。我们的结果表明,没有中断沉积的铟会产生大量的铟波动,具有非常弱的整体压电场强度。然而,使用从五到三十秒范围的中断时间在组成和强烈的压电场中产生均匀的量子阱。

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