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Single-Molecule Spectroscopic Analysis of Adsorption Phenomena on Colloidal Silica Abrasives Used in Chemical-Mechanical Planarization Slurries

机译:化学机械平面化浆料胶体二氧化硅磨料对吸附现象的单分子光谱分析

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Advances in the use of a single-molecule spectroscopic method, fluorescence correlation spectroscopy (FCS), for the determination of the particle size distribution (PSD) of fine dispersions of colloidal silica and ceria abrasive particles employed in CMP slurries are described. The Maximum Entropy Method (MEM) is shown to be an effective approach for PSD analysis using FCS data for fluorescently dyed abrasive particles. FCS also provides an analysis of absorption phenomena on CMP abrasive particles using a fluorescent dye for the quantitative determination of adsorption isotherms. Extension of the FCS technique to the characterization of the adsorption of CMP slurry additive to colloidal silica and ceria abrasives is proposed.
机译:描述了使用单分子光谱法,荧光相关光谱(Fcs)的研究进展,用于测定CMP浆液中使用的胶体二氧化硅和Ceria磨料颗粒的精细分散体的粒度分布(PSD)。最大熵方法(MEM)被示出为使用FCS数据的PSD分析的有效方法,用于荧光染色磨料颗粒。 FCS还使用荧光染料在CMP磨料颗粒上的吸收现象进行分析,用于定量测定吸附等温线。提出了FCS技术的扩展,以表征CMP浆料添加剂对胶体二氧化硅和Ceria磨料的表征。

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