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Temperature dependence of magnetic domain structures of Co particles fabricated by electron beam lithography

机译:电子束光刻法制备的Co粒子的磁畴结构与温度的关系

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Submicron-sized Co particles were fabricated by patterning single crystal Co thin films, and their magnetic domain structures were observed by magnetic force microscopy (MFM) with temperature up to 200 /spl deg/C. The Co films (220 nm in thickness) were epitaxially deposited onto Al/sub 2/O/sub 3/ [001] single-crystal substrates by electron beam evaporation, and from these films (with their c-axis parallel to the surface normal) circular dots with diameters of 0.5, 1, and 2.5 /spl mu/m were patterned by electron beam lithography and Ar ion beam etching. Maze patterns in domain structure were clearly observed in all types of dots. MFM images taken at elevated temperatures did not show prominent change in the domain pattern, which implies stability of Co magnetization up to this temperature. Landau-Lifshitz-Gilbert (LLG) simulation results showed good agreement with these experimental data, and also predicted that a vortex structure will be obtained with thinner (50 nm) dots at 200 /spl deg/C.
机译:通过对单晶Co薄膜进行构图来制造亚微米级的Co粒子,并通过磁力显微镜(MFM)在高达200 / spl deg / C的温度下观察其磁畴结构。通过电子束蒸发并从这些膜(其c轴平行于表面法线)将Co膜(厚度为220 nm)外延沉积到Al / sub 2 / O / sub 3 / [001]单晶衬底上。 )通过电子束光刻和Ar离子束刻蚀将直径分别为0.5、1和2.5 / spl mu / m的圆点图案化。在所有类型的点中都清楚地观察到了域结构中的迷宫图案。在高温下拍摄的MFM图像未显示出畴图案的显着变化,这暗示了在此温度下Co磁化的稳定性。 Landau-Lifshitz-Gilbert(LLG)的模拟结果与这些实验数据显示出良好的一致性,并且还预测到,在200 / spl deg / C的温度下,较细的(50 nm)点将获得涡旋结构。

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