High temperature stable n-i-n resonant tunneling diode embedded InAs quantum dots in GaAs/Al/sub x/Ga/sub 1-x/As double barriers

摘要

The quantum dot (QD) resonant tunneling diode (RTD) with Al/sub x/Ga/sub 1-x/As double-barriers has been investigated under operating large temperature ranges. A superior temperature-stability of peak-to-valley current ratio (PVR) is demonstrated. The electrons of resonant tunneling transport via nm-scale InAs quantum dots buried in GaAs spacer layers bounded by a pair of very thin Al/sub 0.3/Ga/sub 0.7/As barriers.