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High Voltage CMOS Line-up for Display Driver Applications based on 0.13μm CMOS with Aluminum metallization Scheme

机译:基于铝金属化方案的基于0.13μmCMOS的显示驱动器应用的高压CMOS系列

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The present paper describes the development of high voltage CMOS process line-up (5/11/20/30V) for display driver applications, based on 0.13μm CMOS process with aluminum metallization. The advantages are smaller size of SRAM bit cell and lower process cost. High voltage CMOS devices, 1.5V(LV) logic CMOS, 5.5V(MV)CMOS, poly-Si resistor (HR/MR), MOS-capacitor, SRAM and OTP are available. 10.8μm device pitch of 30V CMOS and good electric characteristics were successfully achieved. Thanks to the low cost and wide voltage options, various kind of display driver ICs can now be realized in smaller die size and lower cost.
机译:本文介绍了基于显示铝应用的0.13μmCMOS工艺,用于显示驱动器应用的高压CMOS工艺系列(5/11/20 / 30V)的开发。优点是较小的SRAM位单元尺寸和较低的处理成本。提供高压CMOS器件,1.5V(LV)逻辑CMOS,5.5V(MV)CMOS,多晶硅电阻器(HR / MR),MOS电容器,SRAM和OTP。成功实现了30V CMOS的10.8μm器件间距和良好的电特性。由于具有低成本和宽电压选择,现在可以以更小的裸片尺寸和更低的成本实现各种显示驱动器IC。

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