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DLTS and capacitance transients study of defects induced by neutron irradiation in MOS structures CCD process

机译:MOS结构CCD工艺中子辐照缺陷的DLTS和电容瞬态研究。

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The aim of this paper is to study neutron irradiation effects on PMOS capacitors and NMOSFETs. The characterization of induced defects was made by capacitance transients C(t) measurements, DLTS spectroscopy, and optical DLTS (ODLTS). DLTS spectra present three peaks (1, 2, and 3) due to deep levels created in the semiconductor and two peaks (4 and 5) due to minority carrier generation. Levels 1 and 2 are reported in the literature and it was suggested that the level 2 may be due to the divacancy. Two other minority carrier traps have been observed on ODLTS spectra after irradiation. This can explain the decrease of the minority carrier generation lifetime observed by capacitance transients measurements.
机译:本文的目的是研究中子辐照对PMOS电容器和NMOSFET的影响。感应缺陷的表征是通过电容瞬变C(t)测量,DLTS光谱和光学DLTS(ODLTS)进行的。由于半导体中产生的深能级,DLTS光谱显示了三个峰(1、2和3),而由于少数载流子的产生,出现了两个峰(4和5)。文献报道了1级和2级,并建议2级可能是由于空缺所致。辐照后在ODLTS光谱上观察到另外两个少数载流子陷阱。这可以解释通过电容瞬态测量观察到的少数载流子产生寿命的减少。

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