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DLTS and capacitance transients study of defects induced by neutron irradiation in MOS structures CCD process

机译:MOS结构CCD工艺中子辐射诱导缺陷的DLT和电容瞬变研究

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The aim of this paper is to study neutron irradiation effects on PMOS capacitors and NMOSFETs transistors. The characterization of induced defects was made by capacitance transients C(t) measurements, DLTS spectroscopy, and optical DLTS (ODLTS). DLTS spectra present three peaks (1, 2, and 3) due to deep levels created in the semiconductor and two peaks (4 and 5) due to minority carrier generation. Levels 1 and 2 are reported in the literature and it was suggested that the level 2 may be due to the divacancy. Two other minority carrier traps have been observed on ODLTS spectra after irradiation. This can explain the decrease of the minority carrier generation lifetime observed by capacitance transients measurements.
机译:本文的目的是研究对PMOS电容器和NMOSFET晶体管的中子辐射效应。通过电容瞬变C(T)测量,DLTS光谱学和光学DLT(ODLTS)进行诱导缺陷的表征。由于在半导体中产生的深度和由于少数载波产生,因此DLTS光谱存在由于在半导体和两个峰(4和5)中产生的深层而存在三个峰(1,2和3)。文献中报告了1和2水平,并且建议级别2可能是由于广录的。在照射后,在Odlts光谱上观察到另外两种少数载体捕集物。这可以解释通过电容瞬变测量观察到的少数载波生成寿命的降低。

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