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Plasma Treatment Effects on Structural and Electrical Properties of Fluorinated Amorphous Carbon Films with Low Dielectric Constant Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

机译：等离子体处理对电感耦合等离子体化学气相沉积沉积低介电常数氟化非晶碳膜结构和电性能的影响

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《》|2005年||共6页
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1. Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition [J] . Jeong W. Yi, Young H. Lee, Bakhtier Farouk Thin Solid Films . 2003,第1期

机译：退火对等离子体增强化学气相沉积法沉积的氟化非晶碳膜结构和电性能的影响
2. Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition [J] . C. Shim, J. Yang, Y. C. Quan, Journal de Physique, IV: Proceedings of International Conference . 2001,第3期

机译：等离子体功率和沉积压力对等离子体增强化学气相沉积法沉积低介电常数等离子体聚合环己烷薄膜性能的影响
3. Plasma-Enhanced Chemical Vapor Deposition Growth of Fluorinated Amorphous Carbon Thin Films Using C_4F_8 and Si_2H_6/He for Low-Dielectric-Constant Intermetallic-Layer Dielectrics [J] . Howoon KIM, Jang-Kyoo SHIN, Dae-Hyuk KWON, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2005,第7A期

机译：C_4F_8和Si_2H_6 / He用于低介电常数金属间层电介质的氟化非晶碳薄膜的等离子体化学气相沉积生长
4. Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition [C] . C. Shim, J. Yang, Y.C. Quan, European conference on chemical vapor deposition . 2001

机译：等离子体功率和沉积压力对等离子体增强化学气相沉积沉积的低介电常数等离子体聚合环己烷薄膜的影响
5. Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition. [D] . Jin, Yoonyoung. 2005

机译：通过等离子体增强的含硅的低介电常数碳氟化合物薄膜增强了化学气相沉积。
6. Structural Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition [O] . Kyoung-Mun Kim, Jin Sub Jang, Soon-Gil Yoon, 2020

机译：等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
7. Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films [O] . Wojciech Kijaszek, Waldemar Oleszkiewicz, Zbigniew Znamirowski 2017

机译：射频电感耦合等离子体在金刚石状碳膜的化学气相沉积过程中的应用，用于改性沉积膜的性能
8. Amorphous Carbon Films as Planarization Layers Deposited by Plasma-Enhanced Chemical Vapor Deposition. [R] . Pang, S. W., Horn, M. W. 1990

机译：通过等离子体增强化学气相沉积沉积的无定形碳膜作为平面化层。

Plasma Treatment Effects on Structural and Electrical Properties of Fluorinated Amorphous Carbon Films with Low Dielectric Constant Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

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