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DETERMINATION OF IMPURITIES IN SILICON CARBIDE BY SLURRY INTRODUCTION AXIAL VIEWED INDUCTIVELY COUPLED PLASMA OPTICAL EMISSION SPECTROMETRY

机译：泥浆引入轴向感应耦合等离子体光学发射光谱法测定碳化硅中的杂质。

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1. Determination of impurities in magnesium niobate by slurry introduction axially viewed inductively coupled plasma optical emission spectrometry [J] . Wu D, Qu H, Dong M, Analytical and bioanalytical chemistry . 2007,第6期

机译：浆料引入轴向观察电感耦合等离子体发射光谱法测定铌酸镁中的杂质。
2. Determination of impurities in magnesium niobate by slurry introduction axially viewed inductively coupled plasma optical emission spectrometry [J] . Dongmei Wu, Haiyun Qu, Min Dong, Analytical and Bioanalytical Chemistry . 2007,第6期

机译：浆料引入轴向观察电感耦合等离子体发射光谱法测定铌酸镁中的杂质。
3. Determination of impurities in titanium nitride by slurry introduction axial viewed inductively coupled plasma optical emission spectrometry [J] . Zheng Wang, Zheming Ni, Deren Qiu, Spectrochimica Acta, Part B. Atomic Spectroscopy . 2005,第3期

机译：浆料引入轴向观察电感耦合等离子体发射光谱法测定氮化钛中的杂质。
4. DETERMINATION OF IMPURITIES IN SILICON CARBIDE BY SLURRY INTRODUCTION AXIAL VIEWED INDUCTIVELY COUPLED PLASMA OPTICAL EMISSION SPECTROMETRY [C] . International Beijing Conference and Exhibition on Instrumental Analysis . 2005

机译：通过浆料引入轴向碳化硅碳化硅杂质的测定轴向观察电感耦合等离子体光发射光谱法
5. Expanding the capabilities of inductively coupled plasma optical emission spectrometry and mass spectrometry: Optimisation of plasma and sample introduction conditions. [D] . Makonnen, Yoseif Wessenu. 2015

机译：扩展电感耦合等离子体发射光谱法和质谱仪的功能：优化等离子体和样品引入条件。
6. Performance Parameters of Inductively Coupled Plasma Optical Emission Spectrometry and Graphite Furnace Atomic Absorption Spectrometry Techniques for Pd and Pt Determination in Automotive Catalysts [O] . Marin Senila, Oana Cadar, Lacrimioara Senila, 2020

机译：电感耦合等离子体光发射光谱法和石墨炉原子吸收光谱法的性能参数用于汽车催化剂中的PD和PT测定
7. Determination of impurities in titanium nitride by slurry introduction axial viewed inductively coupled plasma optical emission spectrometry [O] . Wang, Z, Ni, ZM, Qui, DR, 2005

机译：浆料引入轴向观察电感耦合等离子体发射光谱法测定氮化钛中的杂质。
8. Determination of Impurities in Silicon Carbide by ICP AES (Inductively Coupled Plasma Atomic Emission Spectrometry) after Coprecipitation with Lanthanum Hydroxide [R] . Harada, Y., Kurata, N., Furuno, G. 1988

机译：氢氧化镧共沉淀ICp-aEs（电感耦合等离子体原子发射光谱法）测定碳化硅中的杂质

DETERMINATION OF IMPURITIES IN SILICON CARBIDE BY SLURRY INTRODUCTION AXIAL VIEWED INDUCTIVELY COUPLED PLASMA OPTICAL EMISSION SPECTROMETRY

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