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Deposition and characterization of LaS (lanthanum monosulfide) thin films grown by pulsed laser ablation

机译:脉冲激光烧蚀生长的LaS(单硫化镧)薄膜的沉积和表征

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摘要

This work focuses on improving the crystalline property of the LaS thin films by improving the deposition conditions. Many factors can affect the quality of laser deposited films, including vacuum level, laser energy, laser repetition rate, substrate temperature, target to substrate distance, background gas pressure, and substrate bias.
机译:这项工作着重于通过改善沉积条件来改善LaS薄膜的结晶性能。许多因素都会影响激光沉积膜的质量,包括真空度,激光能量,激光重复率,基板温度,目标到基板的距离,背景气压和基板偏压。

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