lanthanum compounds; pulsed laser deposition; thin films; LaS; background gas pressure; crystalline property; laser energy; laser repetition rate; pulsed laser ablation; substrate bias; substrate temperature; target-substrate distance; thin films; vacuum level;
机译:脉冲激光沉积法生长的单硫化镧薄膜的晶粒尺寸,织构和结晶度
机译:在硅衬底上脉冲激光沉积一硫化镧薄膜
机译:脉冲激光沉积生长外延La_(0.6)Sr_(0.4)MnO_3薄膜的磁性能与激光烧蚀条件的关系
机译:脉冲激光烧蚀生长的LAS(镧酮硫醚)薄膜的沉积和表征
机译:用于阴极材料应用的单硫化镧薄膜的脉冲激光沉积。
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:在硅衬底上脉冲激光沉积一硫化镧薄膜