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Field emission properties of Mo-coated Si field emitter arrays and formation of molybdenum silicide

机译:涂钼的硅场致发射器阵列的场致发射特性和硅化钼的形成

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Uniform and reproducible silicon tip arrays were fabricated using the reactive ion etching followed by the re-oxidation sharpening. Molybdenum was coated on the some of the silicon tip array. Current-voltage characteristics and current fluctuations were tested in the high vacuum level. Turn-on voltage of the uncoated tip was 35 V and maximum current was 1 mA, while turn-on voltage of the coated tip was 15 V and maximum current was 6 mA. While uncoated silicon tip was destroyed after 13 minutes after operation and showed rapid lowering of emission current, coated tip showed stable emission characteristics. Obtained currents were proved to be field emission currents using the Fowler-Nordheim plot studies.
机译:使用反应离子刻蚀,然后进行再氧化锐化,制造出均匀且可复制的硅尖端阵列。将钼涂覆在一些硅尖端阵列上。在高真空度下测试了电流-电压特性和电流波动。未涂覆的尖端的开启电压为35 V,最大电流为1 mA,而涂覆的尖端的开启电压为15 V,最大电流为6 mA。手术后13分钟后未涂覆的硅尖端被破坏,并显示出发射电流的快速降低,而涂覆的尖端则显示出稳定的发射特性。使用Fowler-Nordheim图研究证明了获得的电流是场发射电流。

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