The rare earth oxides (REO) have emerged as important insulating materials. Thin insulating films are used in a wide variety of components in optical and electronic devices. Thin films of REO exhibit good dielectric properties, thermal and chemical stability. The electrical resistivity of the films is of the order of 10/sup 14/-10/sup 16/ /spl Omega/ cm and the dielectric constant is in the range of 12-13. Knowledge of the breakdown mechanism can be important for the design of thin film capacitors, varactors, transistors and switching elements with memory. In the present report we discuss the results of the dielectric breakdown study of thin Sm/sub 2/O/sub 3/, Lu/sub 2/O/sub 3/ and Y/sub 2/O/sub 3/ films and propose a model of this process in accordance with which the breakdown process is realized by means of the critical charge accumulation and the corresponding strengthening of the electrical field in the insulator.
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机译:稀土氧化物(REO)已成为重要的绝缘材料。绝缘薄膜广泛用于光学和电子设备的各种组件中。 REO薄膜表现出良好的介电性能,热和化学稳定性。膜的电阻率约为10 / sup 14 / -10 / sup 16 / spl Omega / cm,介电常数在12-13的范围内。了解击穿机理对于薄膜电容器,变容二极管,晶体管和带存储器的开关元件的设计很重要。在本报告中,我们讨论了Sm / sub 2 / O / sub 3 /,Lu / sub 2 / O / sub 3 /和Y / sub 2 / O / sub 3 /薄膜的介电击穿研究的结果,并提出了该过程的模型,根据该模型,通过临界电荷积累和绝缘子中电场的相应增强来实现击穿过程。
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