Amorphous formation on metal surfaces by an intense pulsed ion beam irradiation

摘要

Summary form only given. Recently, intense pulsed ion beams (PIBs) have been interested as a tool for surface modification of metals, because irradiation of PIBs to metals leads to rapid heating of the near surface which is immediately followed by rapid cooling and resolidification. In this paper formation of an amorphous layer on a Ni/sub 65/Cr/sub 15/P/sub 16/B/sub 4/ alloy by a PIB irradiation is successfully demonstrated. A PIB composed of C/sup 2+/ and F/sup 2+/ was produced by an inverse pinch ion diode (IPD) with the pulsed power machine "HARIMA-II". Ion beams produced by the IPD were focused by the electrostatic field in the diode region. A shot of the mixed carbon and fluorine PIB was irradiated on a Ni/sub 65/Cr/sub 15/P/sub 16/B/sub 4/ alloy to make amorphous structure. The amorphous nature of the PIB-processed surface was examined by the X-ray diffractometry (Cu K/sub /spl alpha//, 50 kV, 200 mA). The diffraction pattern of the non-processed substrate reveals the crystalline phase which is characterized by the narrow spectrum. On the other hand, the PIB-processed Ni/sub 65/Cr/sub 15/P/sub 16/B/sub 4/ alloy surface exhibits the typical diffraction pattern of the amorphous structure, when the maximum X-ray diffraction depth is within 0.66 /spl mu/m.