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The carrier transport in the GaSb/AlSb/lnAs/GaSb/AlSb/InAs resonant interband tunneling structures

机译:GaSb / AlSb / InAs / GaSb / AlSb / InAs共振带间隧穿结构中的载流子传输

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The negative differential resistance (NDR) characteristics of GaSb/AlSb/GaSb/AISb/lnAs double barrier structure were improved by incorporating an InAs blocking layer into the well region, i.e. GaSb/AlSb/InAs/GaSb/AlSb/InAs structure. The multiple NDR behaviors as well as high peak-to-valley ratios (PVRs) were observed with appropriate InAs well width. The three-band model was used to investigate the effect of the InAs well on the current-voltage characteristics of GaSb/AlSb/lnAs/GaSb/AISb/lnAs structures.
机译:通过将InAs阻挡层掺入阱区中,改善了Gasb / Alsb / Gasb / AisB / LNAS双阻挡结构的负差分电阻(NDR)特性,即Gasb / Alsb / InAs / Gasb / Alsb / InAs结构。通过适当的Inas宽度观察到多个NDR行为以及高峰谷比率(PVRS)。三带模型用于研究INAS孔的效果对GASB / ALSB / LNA / GASB / AISB / LNAS结构的电流 - 电压特性。

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