Influence of Deposition Parameters on Mechanical Stress and Magnetic Properties in Thick, Electroplated Co-Fe Flux Guides

摘要

A notable advantage of electroplated binary Co-Fe alloys in MEMS applications like sensors and actuators is the high saturation flux density B_s, which may reach values of 2.4 T in a composition range of 50 - 70 wt% Fe. In contrast, there are certain disadvantages limiting the use of these alloys, e. g. high film stress, high corrosion sensitivity and high magnetostriction. The mechanical and magnetic properties of Co-Fe films influence each other strongly. They are determined by the films' microstructure, given by film texture, grain size and morphology, structural defects and impurities. In this study, the effect of process conditions like current density, pulse duration, duty cycle, pH-value of the plating bath and application of a constant magnetic field parallel to the electrode surface on film stress and magnetic properties are examined.