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Non Reciprocal Silicon-Organic Nanophotonic Structures

机译:不可逆的有机硅纳米光子结构

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摘要

We present a setup to measure the nonreciprocal magneto-optical phase shift in air and polymer cladded silicon on insulator waveguides. A high sensitivity could be achieved for the setup sufficient to determine the effect produced by silicon and silica. A silicon waveguide covered with a Fe_3O_4 nanoparticle containing polymer shows an amplitude modulation resulting from Faraday ellipticity which is of the same order of magnitude as the Faraday effect in silicon. We further present the theoretical concept of an optical isolator based on resonance splitting in a silicon ring resonator covered with a magneto-optical polymer cladding. A polymer magneto-optical cladding causing a 0.01 amplitude of the offdiagonal element of the dielectric tensor is assumed. It is shown that the derived resonance splitting of the clockwise and counterclockwise modes increases for smaller ring radii. For the ring with a radius of approximately 1.5 μm, a 29 GHz splitting is demonstrated. An integrated optical isolator with a 10μm geometrical footprint is proposed based on a critically coupled ring resonator.
机译:我们提出了一种测量绝缘体波导上空气和聚合物包覆的硅中不可逆磁光相移的设置。对于足以确定由硅和二氧化硅产生的效果的设置,可以实现很高的灵敏度。覆盖有含Fe_3O_4纳米粒子的聚合物的硅波导显示出由法拉第椭圆率引起的幅度调制,该幅度调制与硅中的法拉第效应的幅度相同。我们进一步提出了一种光隔离器的理论概念,该隔离器基于在覆盖有磁光聚合物覆层的硅环谐振器中的谐振分裂。假定使用聚合物磁光覆层,使介电张量的对角线元素的振幅为0.01。结果表明,对于较小的环形半径,顺时针和逆时针模式的共振分裂会增加。对于半径约为1.5μm的环,演示了29 GHz的分裂。提出了一种基于临界耦合环形谐振器的集成光学隔离器,其几何尺寸为10μm。

著录项

  • 来源
    《Linear and nonlinear optics of organic materials XI》|2011年|p.81130H.1-81130H.9|共9页
  • 会议地点 San Diego CA(US)
  • 作者单位

    Institute of Optical and Electronic Materials Hamburg University of Technology, D-21073 Hamburg, Germany;

    Institute of Optical and Electronic Materials Hamburg University of Technology, D-21073 Hamburg, Germany;

    Institute of Optical and Electronic Materials Hamburg University of Technology, D-21073 Hamburg, Germany;

    K.U.-Leuven, Molecular and Nanomaterials Division, B-3001 Heverlee, Belgium;

    K.U.-Leuven, Molecular and Nanomaterials Division, B-3001 Heverlee, Belgium;

    Institute of Optical and Electronic Materials Hamburg University of Technology, D-21073 Hamburg, Germany;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用光学;工程材料一般性问题;
  • 关键词

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