首页> 外文会议>ISES (International Solar Energy Society) 2001 Solar World Congress Vol.3; Nov 25-30, 2001; Adelaide, Australia >Optical Modelling of Thin Film Solar Cells with Textured Interfaces using the Effective Medium Approximation
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Optical Modelling of Thin Film Solar Cells with Textured Interfaces using the Effective Medium Approximation

机译:使用有效介质近似的具有纹理界面的薄膜太阳能电池的光学建模

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Simple methods for increasing the maximum achievable current density of amorphous silicon (a-Si:H) solar cells include bandgap and layer thickness optimisation, and light confinement strategies. The goal of the optical modelling work presented here has been to examine the nature and potential of these effects, in particular the optical enhancement resulting from the use of finely textured transparent conducting oxides (TCOs). A computer program that combines coherent and incoherent optical theory has been used as a flexible tool for simulating the performance of any general thin film solar cell structure. An Effective Medium Approximation (EMA) has been used to model the optical effects of microroughness (texturing with correlation lengths smaller than the wavelength of light). This work suggests that effective interface grading due to microroughness does have a significant effect on the optical performance of a-Si:H solar cells, and that both enhancement and deterioration in the maximum achievable current density (MACD) can be the outcome. Where both effective interface grading (microroughness) and larger scale texturing (macroroughness) are fully exploited, optical yields may be increased beyond their current level. This work emphasises the importance of characterising and controlling the interface morphology to optimise the short circuit current and maintain the open curcuit voltage.
机译:增加非晶硅(a-Si:H)太阳能电池可达到的最大电流密度的简单方法包括带隙和层厚度优化以及光限制策略。此处介绍的光学建模工作的目标是检查这些效应的性质和潜力,尤其是检查由于使用精细纹理化的透明导电氧化物(TCO)而产生的光学增强效果。结合了相干和非相干光学理论的计算机程序已被用作模拟任何普通薄膜太阳能电池结构性能的灵活工具。有效介质近似(EMA)已用于模拟微粗糙度的光学效果(相关长度小于光波长的纹理)。这项工作表明,由于微粗糙度引起的有效界面分级对a-Si:H太阳能电池的光学性能确实有显着影响,并且最大可达到的电流密度(MACD)的提高和降低都是结果。如果充分利用了有效的界面分级(微观粗糙度)和大规模纹理化(宏观粗糙度),光学产量可能会增加到超过当前水平。这项工作强调了表征和控制界面形态以优化短路电流并维持开路电流的重要性。

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