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Doping of 6H-SiC pn structures by proton irradiation

机译:质子辐照掺杂6H-SiC pn结构

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The influence of proton irradiation on current-voltage characteristics, N_d-N_a values and parameters of deep centres in 6H-SiC pn structures grown by sublimation epitaxy has been studied. The irradiation was carried out with 8 MeV protons in the range of doses from 10~14 to 10~16 cm~-2. Irradiation with a dose of 3.6X10~14 cm~-2 leaves the voltage drop at high forward currents (10 A/cm~2) practically unchanged. For higher irradiation dose of 1.8X10~15 cm~-2, the frward voltage drop and the degree of compensation in the samples increased; partial annealing of the radiation defects and partial recovery of the electrical parameters occurred after annealing at T approx 400-800 K. Irradiation with a dose of 5.4X10~15 cm~-2 resulted in very high resistance in forward biased pn structures which remained high even after heating to 500 deg C. It is suggested that proton irradiation causes decreasign of the lifetime and formation of an i-or an additional p-layer. direct c 1999 Published by Elsevier Science B.V. All rights reserved.
机译:研究了质子辐照对升华外延生长的6H-SiC pn结构中电流电压特性,N_d-N_a值和深中心参数的影响。用8 MeV质子辐照,辐照剂量范围为10〜14至10〜16 cm〜-2。以3.6X10〜14 cm〜-2的剂量辐照,在高正向电流(10 A / cm〜2)下的电压降几乎不变。较高的辐照剂量为1.8X10〜15 cm〜-2时,样品的正向电压降和补偿度增加。在大约400-800 K的温度下退火后,发生了辐射缺陷的部分退火和电参数的部分恢复。剂量为5.4X10〜15 cm〜-2的辐射导致正向偏置pn结构具有很高的电阻,并保持较高的电阻即使在加热到500摄氏度后也是如此。建议质子辐照会导致寿命缩短并形成i层或其他p层。直接c 1999年,Elsevier Science B.V.保留所有权利。

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