首页> 外文会议>International VLSI Multilevel Interconnection Conference(VMIC); 20070925-27; Fremont,CA(US) >Reduction of the Wafer Backside Chips and Crack in the Backend of the Line Wafer Manufacturing Process
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Reduction of the Wafer Backside Chips and Crack in the Backend of the Line Wafer Manufacturing Process

机译:减少晶圆背面芯片和在线晶圆制造工艺后端的裂纹

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摘要

This paper describes process improvements that have been implemented to reduce wafer backside edge chips and cracks. The induced cracks generated at the end of the process line can be detrimental. During Parametric Testing (PT) or Electrical Wafer Sort (EWS) the chipped wafer may shatter into pieces, hence impacting the company's revenues. Figure 1 below shows chips and cracks induced from backend processes.
机译:本文介绍了为减少晶片背面边缘的碎屑和裂缝而实施的工艺改进。在生产线末端产生的诱发裂纹可能是有害的。在参数测试(PT)或电子晶圆分类(EWS)期间,切碎的晶圆可能会破碎成碎片,从而影响公司的收入。下面的图1显示了后端处理引起的切屑和裂纹。

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