Ex situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes

摘要

Ex-situ generated bubbles injected in the acoustical field will enhance the particle removal efficiency. This process improvement goes along with optimization of the rotation speed (>1000RPM), the acoustic power and the frequency (1MHz>2MHz>3MHz). An alternative window of operation is the low power/low gas regime where the dwell time plays an important role.