Case studies of the use of Image Processing in Metrology and Failure Analysis

摘要

In this contribution we have discussed three case studies of the use of image processing in metrology and failure analysis. We demonstrated the use of edge detection and quantification of image intensities to obtain probability distribution functions for transistor CD. We examined the use of cross-correlation to estimate the on image resolution of a SEM Finally we explored the manner in which the concept of entropy and mutual information can be utilized to isolate regions of current AFM scans that could benefit from further analysis.