GAS PHASE ANALYSIS OF TiC AND TiN PLASMA ENHANCED CVD PROCESSES BY MOLECULAR BEAM MASS SPECTROMETRY

摘要

Molecular beam mass spectrometry (MBMS) has been used to analyze the gas phase of Ar and Ar+TiCl_4 plasmas. The gas phase composition was analyzed as a function of pressure and plasma power. The results show that an increase in plasma power increases the concentration of dissociated and ionized species in the plasma phase. Higher plasma power increased the intensity of ions from TiCl_4 and Ar up until 100 W and then ion intensity reached a plateau value with increasing rf power. The Ar ion intensity increases with total reactor pressure up to 200 mTorr and then ion intensity was found to decrease with pressure. Ion energy distribution studies attempted showed that there exist a ion energy range for each individual ions.