首页> 外文会议>International Conference on Silicon Carbide and Related Materials 2003 pt.1(ICSCRM 2003); 20031005-20031010; Lyon; FR >Investigation of Graphite Particle Inclusions in 6H-SiC Single Crystals Grown by Sublimation Boule Growth Technique
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Investigation of Graphite Particle Inclusions in 6H-SiC Single Crystals Grown by Sublimation Boule Growth Technique

机译:升华晶棒生长技术生长6H-SiC单晶中石墨颗粒夹杂物的研究

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摘要

A generation mechanism of graphite particle inclusions in 6H-SiC single crystals grown by sublimation boule growth technique was investigated based upon HRTEM analysis. The one side of SiC/graphite interface that is perpendicular to [0001] had vicinal atomic step of 6H-SiC. At the opposite side of the interface, singular (0001) 6H-SiC and (0001) graphite contacted with identical crystal orientation. Graphite layers close to the singular interface showed well ordered crystal structure, while it was observed to be disturbed toward the vicinal interface. From EDX analysis, the disturbance of graphite layers particularly close to the vicinal interface was supposed to be due to the high concentration of silicon contained species. Generation mechanism of graphite particle inclusions in SiC single crystals proposed in the present research is that they generated through the dissociative evaporation of SiC from the vicinal step of SiC, and the simultaneous formation of graphite layers.
机译:基于HRTEM分析,研究了升华晶棒生长技术生长的6H-SiC单晶中石墨颗粒夹杂物的生成机理。垂直于[0001]的SiC /石墨界面的一侧具有6H-SiC的邻近原子台阶。在界面的相反侧,奇异的(0001)6H-SiC和(0001)石墨以相同的晶体取向接触。靠近奇异界面的石墨层显示出井井有条的晶体结构,同时观察到它对邻界面有干扰。根据EDX分析,石墨层的扰动,尤其是靠近邻界面的石墨层,被认为是由于高浓度的含硅物质引起的。本研究提出的SiC单晶中石墨颗粒夹杂物的生成机理是它们是通过SiC的邻近步骤中SiC的解离蒸发和同时形成石墨层而产生的。

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