Improving 4H-SiC/SiO_2 Interface Properties by Depositing Ultra-Thin Si Nitride Layer Prior to Formation of SiO_2 and Annealing

摘要

We report dramatic improvement in electrical properties of 4H-SiC/SiO_2 interface by depositing an ultra-thin layer of silicon nitride on 4H-SiC prior to formation of silicon oxide and annealing. AC conductance measurements reveal interface-trap density equal to or below 1xl0~(12)/cm~2- eV at energies near the conduction band edge. XPS spectra confirm the presence of N at the interface and suggest possible bonding between N and C.