Plasma-Surface Interactions in the Plasma Deposition Mechanism of Structured Teflon-like Coatings

摘要

C_2F_4 and c-C_4F_8 fed plasmas have been investigated for the deposition of fluorocarbon coatings. While continuous glow discharges lead to flat films with a moderate fluorine content, modulated plasmas allows for the deposition of highly fluorinated coatings with a varaiable morphology. It is shown that, particularly in the case of tetrafluorethylene, a unique chemical and morphological structure can be obtained and it can be explained with a modified activated growth model mechanism.