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Performance Evaluation of Static Random Access Memory (SRAM) based on Negative Capacitance FinFET

机译:基于负电容FinFET的静态随机存取存储器(SRAM)的性能评估

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In this work, a comprehensive evaluation was performed for negative capacitance FinFET (NC-FinFET) based static random access memory (NC-SRAM) using the calibrated current-voltage relationship and dynamic behavior of NC-FinFETs that were experimentally demonstrated at 14-nm technology node. Important performance indicators of SRAM including static noise margin and standby leakage power were assessed at different values of supply voltage (VDD). Compared with the conventional FinFET-based SRAM, it was found that NC-SRAM shows different behaviors at high VDD and low VDD. For example, at low VDD, standby leakage power consumption of NC-SRAM is higher than conventional SRAM which is different from the conclusion drew by previous works when only high VDD case was considered. Our evaluation gives new insights on the design of future NC-FinFET-based SRAMs, particularly with extremely low supply voltage.
机译:在这项工作中,使用校准的电流-电压关系和NC-FinFET的动态行为(在14nm处实验证明),对基于负电容FinFET(NC-FinFET)的静态随机存取存储器(NC-SRAM)进行了全面评估。技术节点。在不同的电源电压值下评估了SRAM的重要性能指标,包括静态噪声容限和待机泄漏功率(V \ n DD \ n)。与传统的基于FinFET的SRAM相比,发现NC-SRAM在高V \ n DD \ n和低V \ n DD \ n。例如,在低V \ n DD \ n,NC-SRAM的待机泄漏功耗比常规SRAM高,这与以前的工作得出的结论不同,只有高V \ n DD \ n的情况。我们的评估为未来基于NC-FinFET的SRAM的设计提供了新见解,特别是在极低电源电压的情况下。

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