Characterizing Diamond Disc Substrate Loss and Diamond Micro-Wear in Copper CMP

摘要

It is well known that pad conditioning is necessary to prevent removal rate decay in CMP. However, depending on process kinematics, ionic strength of the slurry, oxidizer concentration, concentration and nature of slurry abrasive particles, disc down force, and design and materials of construction of the diamond and the substrate on which the diamonds are mounted, chemical or abrasive wear of the conditioner itself may be sufficient to require replacement of the disc within ten or twenty hours. In studying diamond wear, it is important to note that: 1. Extended use of diamond conditioners causes minimal diamond wear (known as 'micro-wear') which can be quantified through white light interferometry [Ref. 1].