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DLTS and PR studies of partially relaxed InGaAs/GaAs heterostructures grown by MOVPE

机译:通过MOVPE生长的部分弛豫InGaAs / GaAs异质结构的DLTS和PR研究

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The studies of electrical activity of deep electron traps and the optical response of partially-strain relaxed In_xGa_(1-x)As layers (x=5.5%, 7.7% and 8.6%) grown by metalorganic vapour-phase epitaxy (MOVPE) have been performed by means of deep-level transient spectroscopy (DLTS) and photoreflectance (PR). DLTS measurements revealed two electron traps. One of the trap has been attributed to electron states at a-type misfit dislocations. The other trap has been ascribed to the EL2 point defect. The PR spectra at room temperature were measured and analysed. By applying the results of theoretical calculations which include excitonic and strain effects, we were able to estimate the extent of strain relaxation and the values of residual strain in the partially relaxed epitaxial layers.
机译:已经研究了通过有机金属气相外延(MOVPE)生长的深电子陷阱的电活动和部分应变的弛豫In_xGa_(1-x)As层(x = 5.5%,7.7%和8.6%)的光学响应的​​研究。借助深层瞬态光谱(DLTS)和光反射(PR)进行。 DLTS测量显示出两个电子陷阱。陷阱之一归因于a型失配位错的电子态。另一个陷阱已归因于EL2点缺陷。测量并分析了室温下的PR光谱。通过应用包括激子效应和应变效应在内的理论计算结果,我们能够估算出应变松弛程度和部分松弛外延层中的残余应变值。

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