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Metal In-Diffusion During Fe and Co-Germanidation of Germanium

机译:铁和锗的共锗化过程中金属的扩散

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In this paper, the deep levels occurring in Fe- or Co-germanide Schottky barriers on n-type Ge have been studied by Deep Level Transient Spectroscopy (DLTS). As is shown, no traps have been found for germanidation temperatures up to 500℃, suggesting that in both cases no marked metal in-diffusion takes place during the Rapid Thermal Annealing (RTA) step. Deep acceptor states in the upper half of the Ge band gap and belonging to substitutional Co and Fe can be detected by DLTS only at higher RTA temperatures (T_(RTA))- For the highest Trta, deep levels belonging to other metal contaminants (Cu) have been observed as well. Simultaneously, the reverse current of the Schottky barriers increases with T_(RTA), while the barrier height is also strongly affected.
机译:在本文中,已经通过深能级瞬态光谱法(DLTS)研究了在n型Ge上的Fe或Co-德国锗化物肖特基势垒中发生的深能级。如图所示,未发现高达500℃的锗化温度的陷阱,这表明在两种情况下,快速热退火(RTA)步骤中都没有明显的金属扩散。 DLTS仅在较高的RTA温度(T_(RTA))下才能检测到Ge带隙上半部分的属于取代Co和Fe的深受体态-对于最高Trta而言,属于其他金属污染物(Cu)的深能级)也已被观察到。同时,肖特基势垒的反向电流随T_(RTA)的增加而增大,势垒高度也受到很大影响。

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