Plasma ignition and current control considerations for magnetron sputtering power supplies

摘要

Physical vapor deposition processes require different types of special power supplies for the ignition and sustaining of the plasma inside the sputtering chamber. The paper identifies some requirements for the design of a pulsed DC converter. Experiments have been carried out to identify the current-voltage characteristics of the vacuum chamber with the supply of different gases, and gas mixtures in the usable pressure domain. The vacuum chamber was supplied with voltage and current impulse trains with various parameters in order to acquire relevant data regarding the gas breakdown in pulsed power mode. A power electronic converter topology and control routine has been proposed, which is suitable for plasma ignition and discharge current control. The proof of concept has been demonstrated with the help of the magnetron sputtering chamber supplied by a test circuit.