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Effects of Hydrogenation-Related Processes on Low Temperature Polysilicon TFTs Stability

机译:氢化相关工艺对低温多晶硅TFT稳定性的影响

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摘要

Hydrogenation was an effective way to reduce the density of inter- and intra-grain defect in polysilicon TFTs. In this study, the effects of hydrogenation related process were characterized for the low temperature polysilicon TFTs. The impact of hot carrier reliability and long-term stability related hydrogenation was also considered.
机译:氢化是降低多晶硅TFT中晶粒间和晶粒内缺陷密度的有效方法。在这项研究中,表征了低温多晶硅TFT加氢相关工艺的影响。还考虑了热载流子可靠性和与氢化有关的长期稳定性的影响。

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