Discharge characteristics of MgO thin films deposited by sputtering

摘要

The discharge characteristics were obtained for MgO thin films deposited on quartz glass substrates at the sputtering gas of Ar and Ar/20%O2 mixture. The MgO films were prepared by a RF magnetron sputtering with MgO sintered ceramic target. The breakdown voltages for electrode materials of MgO thin film deposited in Ar and Ar/20%O2 mixture were measured under various Ne pressures with a V-Q Lissajous method. The breakdown voltage of MgO thin films deposited by the sputtering gas of Ar/20%O2 mixture decreases lower than that of Ar. The columnar structure of cross section for MgO thin films deposited by the sputtering gas of Ar/20%O2 mixture is clearly than that of Ar. The columnar structure of MgO thin films· seem to affect the breakdown voltages or the secondary electron emission properties.