首页> 外文会议>Hydrogen in semiconductors and metals >Quantum diffusionof H(D) in semiconductors and metals, and the role of the interactionwith impurities
【24h】

Quantum diffusionof H(D) in semiconductors and metals, and the role of the interactionwith impurities

机译:H(D)在半导体和金属中的量子扩散以及与杂质相互作用的作用

获取原文
获取原文并翻译 | 示例

摘要

The mobility of hydrogen and its isotopes in metals has been the object of investigation for several years, whereas the diffusion studies of H in doped semiconductors started more recently. Although the H diffusion coefficient in metals may be several orders of magnitudes higher than in semicoductors, the dynamics of H in metals and semiconductors presents many common features, like precipitation, trapping by heavier impurities and, as indicated by recent results, quantum tunneling at low temperature.
机译:氢及其同位素在金属中的迁移率一直是研究的目标,而H在掺杂半导体中的扩散研究则是最近才开始的。尽管金属中的H扩散系数可能比半导体中的H扩散系数高几个数量级,但金属和半导体中H的动力学表现出许多共同的特征,例如沉淀,被较重的杂质捕获以及最近的结果表明,在较低的温度下量子隧穿温度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号