首页> 外文会议>Growth, characterisation and applications of bulk II-VIs >Characterization of CdTe substrates and MOCVD Cd_1-xZn_xTe epilayers
【24h】

Characterization of CdTe substrates and MOCVD Cd_1-xZn_xTe epilayers

机译:CdTe衬底和MOCVD Cd_1-xZn_xTe外延层的表征

获取原文
获取原文并翻译 | 示例

摘要

The quality of CdTe substrates and of Cd_1-xZn_xTe (x<=0.1) epilayers grown by metalorganic chemical vapor depositon (MOCVD) on CdTe substrates, were characterized by Raman scattering, by photoluminescence (PL) as well as by X-ray double crystal rocking curve (DCRC). At low temperature the Raman intensity of the LO phonon was enhanced wherever there was a structural defect. the quantitative measure of the structural perfection is related to the ratio between the defect band and excitonic peaks, and correlates with the X-ray full-width at half-maximum (FWHM) of the layer peak. It is shown that in addition to these parameters, the FWHM of the PL defect band is a useful parameter to determine the quality of the epilayer, and a good correlation is obtained between the different parameters. The effect of zinc partial pressure during growth and the reactor design are studied. The results indicate that crystalline imperfection is caused by lattice mismatch between the CdTe substrate and the CdZnTe epilayer and by the nonuniformity of the zinc composition throughout the layers. direct c 1999 Elsevier Science B.V. All rights reserved.
机译:通过拉曼散射,光致发光(PL)以及X射线双晶表征了CdTe衬底和通过金属有机化学气相沉积(MOCVD)在CdTe衬底上生长的Cd_1-xZn_xTe(x <= 0.1)外延层的质量摇摆曲线(DCRC)。在低温下,无论在何处出现结构缺陷,LO声子的拉曼强度都会提高。结构完善性的定量度量与缺陷带和激子峰之间的比率有关,并且与层峰的半峰全宽(FWHM)相关。结果表明,除了这些参数外,PL缺陷带的FWHM是确定外延层质量的有用参数,并且在不同参数之间也具有良好的相关性。研究了锌分压在生长过程中的影响以及反应器的设计。结果表明,晶体缺陷是由CdTe衬底和CdZnTe外延层之间的晶格失配以及整个层中锌组成的不均匀性引起的。直接c 1999 Elsevier Science B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号